Superhydrophobic CF x coating via in-line atmospheric RF plasma of He-CF 4-H 2

Seong Kim; Jeong Hoon Kim; Bang Kwon Kang; Han S. Uhm

doi:10.1021/la0521948

Superhydrophobic CF _x coating via in-line atmospheric RF plasma of He-CF ₄-H ₂

Seong Kim, Jeong Hoon Kim, Bang Kwon Kang, Han S. Uhm

Research output: Contribution to journal › Article › peer-review

114 Scopus citations

Abstract

Stable superhydrophobic coatings on various substrates are attained with an in-line atmospheric rf plasma process using CF ₄, H ₂, and He. The coating layer is composed of CF _x nanoparticulates and has an average roughness of ∼10 nm. This roughness is much smaller than other surfaces reported for superhydrophobicity in the literature. The superhydrophobic coatings are produced on both metallic and insulating substrates without any need of separate microroughening or vacuum lines.

Original language	English (US)
Pages (from-to)	12213-12217
Number of pages	5
Journal	Langmuir
Volume	21
Issue number	26
DOIs	https://doi.org/10.1021/la0521948
State	Published - Dec 20 2005

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Surfaces and Interfaces
Spectroscopy
Electrochemistry

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10.1021/la0521948

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abstract = "Stable superhydrophobic coatings on various substrates are attained with an in-line atmospheric rf plasma process using CF 4, H 2, and He. The coating layer is composed of CF x nanoparticulates and has an average roughness of ∼10 nm. This roughness is much smaller than other surfaces reported for superhydrophobicity in the literature. The superhydrophobic coatings are produced on both metallic and insulating substrates without any need of separate microroughening or vacuum lines.",

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