Superior Electro-Oxidation and Corrosion Resistance of Monolayer Transition Metal Disulfides

Daniel S. Schulman, Dan May-Rawding, Fu Zhang, Drew Buzzell, Nasim Alem, Saptarshi Das

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Physics of monolayer and few-layer transition metal dichalcogenides (TMDs) and chemistry of few-layer TMDs have been well studied in recent years in the context of future electronic, optoelectronic, and energy harvesting applications. However, what has escaped the attention of the scientific community is the unique chemistry of monolayer TMDs. It has been demonstrated that the basal plane of multilayer TMDs is chemically inert, whereas edge sites are chemically active. In this article, we experimentally demonstrate that the edge reactivity of the TMDs can be significantly impeded at the monolayer limit through monolayer/substrate interaction, thus making the monolayers highly resistant to electrooxidation and corrosion. In particular, we found that few-layer flakes of MoS2 and WS2 exfoliated on conductive TiN substrates are readily corroded beyond a certain positive electrode potential, while monolayer remnants are left behind unscathed. The electrooxidation resistance of monolayers was confirmed using a plethora of characterization techniques including atomic force microscope (AFM) imaging, Raman spectroscopy, photoluminescence (PL) mapping, scanning/transmission electron microscope (S/TEM) imaging, and selected area electron diffraction (SAED). It is believed that strong substrate monolayer interaction compared to the relatively weak interlayer van der Waals interaction is responsible for the superior monolayers chemical stability in highly corrosive oxidizing environments. Our findings could pave the way for the implementation of monolayer transition metal disulfides as superior anticorrosion coating which can have a significant socioeconomic impact.

Original languageEnglish (US)
Pages (from-to)4285-4294
Number of pages10
JournalACS Applied Materials and Interfaces
Volume10
Issue number4
DOIs
StatePublished - Jan 31 2018

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Electrooxidation
Oxidation resistance
Disulfides
Transition metals
Corrosion resistance
Monolayers
Substrates
Imaging techniques
Caustics
Energy harvesting
Chemical stability
Electron diffraction
Optoelectronic devices
Raman spectroscopy
Photoluminescence
Multilayers
Microscopes
Electron microscopes
Physics
Corrosion

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

Cite this

Schulman, Daniel S. ; May-Rawding, Dan ; Zhang, Fu ; Buzzell, Drew ; Alem, Nasim ; Das, Saptarshi. / Superior Electro-Oxidation and Corrosion Resistance of Monolayer Transition Metal Disulfides. In: ACS Applied Materials and Interfaces. 2018 ; Vol. 10, No. 4. pp. 4285-4294.
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Superior Electro-Oxidation and Corrosion Resistance of Monolayer Transition Metal Disulfides. / Schulman, Daniel S.; May-Rawding, Dan; Zhang, Fu; Buzzell, Drew; Alem, Nasim; Das, Saptarshi.

In: ACS Applied Materials and Interfaces, Vol. 10, No. 4, 31.01.2018, p. 4285-4294.

Research output: Contribution to journalArticle

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