Suppression of buoyancy in a prototypical CVD reactor by geometry modification

S. P. Vanka, Gang Luo, Nick G. Glumac

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    Buoyancy plays a detrimental role in chemical vapor deposition reactors employed for thin film deposition. Buoyancy driven fluid flow causes complex flow patterns which alter the transport of the precursor gases to the substrate, and leads to nonuniform deposition patterns. Consequently, many CVD reactors operate under low pressure to mitigate these flow patterns. However, the growth rates at such pressures are relatively low. Operating a CVD reactor under vacuum conditions is also inconvenient because of the associated hardware that is required. In the present work, we have numerically explored the performance of a new type of stagnation flow CVD reactor at pressures close to atmospheric pressure. The new geometry resembles that of a pancake reactor, but the gases are supplied through a long vertical inlet. The annular wall above the substrate is maintained at a low temperature to avoid deposition on this surface. The substrate is also rotated to improve the hydrodynamic patterns and provide azimuthal symmetry. We report results of a number of high-resolution calculations in this reactor to demonstrate its merits for operation at sub-atmospheric and atmospheric pressures. It is shown that the growth rate is significantly large, in addition to a high degree of film uniformity.

    Original languageEnglish (US)
    Title of host publicationProceedings of the 2003 ASME Summer Heat Transfer Conference, Volume 3
    Pages117-125
    Number of pages9
    StatePublished - Dec 1 2003
    Event2003 ASME Summer Heat Transfer Conference (HT2003) - Las Vegas, NV, United States
    Duration: Jul 21 2003Jul 23 2003

    Publication series

    NameProceedings of the ASME Summer Heat Transfer Conference
    Volume2003

    Other

    Other2003 ASME Summer Heat Transfer Conference (HT2003)
    CountryUnited States
    CityLas Vegas, NV
    Period7/21/037/23/03

    Fingerprint

    Buoyancy
    Chemical vapor deposition
    Geometry
    Flow patterns
    Atmospheric pressure
    Substrates
    Gases
    Flow of fluids
    Hydrodynamics
    Vacuum
    Hardware
    Thin films
    Temperature

    All Science Journal Classification (ASJC) codes

    • Engineering(all)

    Cite this

    Vanka, S. P., Luo, G., & Glumac, N. G. (2003). Suppression of buoyancy in a prototypical CVD reactor by geometry modification. In Proceedings of the 2003 ASME Summer Heat Transfer Conference, Volume 3 (pp. 117-125). (Proceedings of the ASME Summer Heat Transfer Conference; Vol. 2003).
    Vanka, S. P. ; Luo, Gang ; Glumac, Nick G. / Suppression of buoyancy in a prototypical CVD reactor by geometry modification. Proceedings of the 2003 ASME Summer Heat Transfer Conference, Volume 3. 2003. pp. 117-125 (Proceedings of the ASME Summer Heat Transfer Conference).
    @inproceedings{74e3538246094ec9ae0b9f244d0bd3af,
    title = "Suppression of buoyancy in a prototypical CVD reactor by geometry modification",
    abstract = "Buoyancy plays a detrimental role in chemical vapor deposition reactors employed for thin film deposition. Buoyancy driven fluid flow causes complex flow patterns which alter the transport of the precursor gases to the substrate, and leads to nonuniform deposition patterns. Consequently, many CVD reactors operate under low pressure to mitigate these flow patterns. However, the growth rates at such pressures are relatively low. Operating a CVD reactor under vacuum conditions is also inconvenient because of the associated hardware that is required. In the present work, we have numerically explored the performance of a new type of stagnation flow CVD reactor at pressures close to atmospheric pressure. The new geometry resembles that of a pancake reactor, but the gases are supplied through a long vertical inlet. The annular wall above the substrate is maintained at a low temperature to avoid deposition on this surface. The substrate is also rotated to improve the hydrodynamic patterns and provide azimuthal symmetry. We report results of a number of high-resolution calculations in this reactor to demonstrate its merits for operation at sub-atmospheric and atmospheric pressures. It is shown that the growth rate is significantly large, in addition to a high degree of film uniformity.",
    author = "Vanka, {S. P.} and Gang Luo and Glumac, {Nick G.}",
    year = "2003",
    month = "12",
    day = "1",
    language = "English (US)",
    isbn = "0791836959",
    series = "Proceedings of the ASME Summer Heat Transfer Conference",
    pages = "117--125",
    booktitle = "Proceedings of the 2003 ASME Summer Heat Transfer Conference, Volume 3",

    }

    Vanka, SP, Luo, G & Glumac, NG 2003, Suppression of buoyancy in a prototypical CVD reactor by geometry modification. in Proceedings of the 2003 ASME Summer Heat Transfer Conference, Volume 3. Proceedings of the ASME Summer Heat Transfer Conference, vol. 2003, pp. 117-125, 2003 ASME Summer Heat Transfer Conference (HT2003), Las Vegas, NV, United States, 7/21/03.

    Suppression of buoyancy in a prototypical CVD reactor by geometry modification. / Vanka, S. P.; Luo, Gang; Glumac, Nick G.

    Proceedings of the 2003 ASME Summer Heat Transfer Conference, Volume 3. 2003. p. 117-125 (Proceedings of the ASME Summer Heat Transfer Conference; Vol. 2003).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    TY - GEN

    T1 - Suppression of buoyancy in a prototypical CVD reactor by geometry modification

    AU - Vanka, S. P.

    AU - Luo, Gang

    AU - Glumac, Nick G.

    PY - 2003/12/1

    Y1 - 2003/12/1

    N2 - Buoyancy plays a detrimental role in chemical vapor deposition reactors employed for thin film deposition. Buoyancy driven fluid flow causes complex flow patterns which alter the transport of the precursor gases to the substrate, and leads to nonuniform deposition patterns. Consequently, many CVD reactors operate under low pressure to mitigate these flow patterns. However, the growth rates at such pressures are relatively low. Operating a CVD reactor under vacuum conditions is also inconvenient because of the associated hardware that is required. In the present work, we have numerically explored the performance of a new type of stagnation flow CVD reactor at pressures close to atmospheric pressure. The new geometry resembles that of a pancake reactor, but the gases are supplied through a long vertical inlet. The annular wall above the substrate is maintained at a low temperature to avoid deposition on this surface. The substrate is also rotated to improve the hydrodynamic patterns and provide azimuthal symmetry. We report results of a number of high-resolution calculations in this reactor to demonstrate its merits for operation at sub-atmospheric and atmospheric pressures. It is shown that the growth rate is significantly large, in addition to a high degree of film uniformity.

    AB - Buoyancy plays a detrimental role in chemical vapor deposition reactors employed for thin film deposition. Buoyancy driven fluid flow causes complex flow patterns which alter the transport of the precursor gases to the substrate, and leads to nonuniform deposition patterns. Consequently, many CVD reactors operate under low pressure to mitigate these flow patterns. However, the growth rates at such pressures are relatively low. Operating a CVD reactor under vacuum conditions is also inconvenient because of the associated hardware that is required. In the present work, we have numerically explored the performance of a new type of stagnation flow CVD reactor at pressures close to atmospheric pressure. The new geometry resembles that of a pancake reactor, but the gases are supplied through a long vertical inlet. The annular wall above the substrate is maintained at a low temperature to avoid deposition on this surface. The substrate is also rotated to improve the hydrodynamic patterns and provide azimuthal symmetry. We report results of a number of high-resolution calculations in this reactor to demonstrate its merits for operation at sub-atmospheric and atmospheric pressures. It is shown that the growth rate is significantly large, in addition to a high degree of film uniformity.

    UR - http://www.scopus.com/inward/record.url?scp=1842691024&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=1842691024&partnerID=8YFLogxK

    M3 - Conference contribution

    AN - SCOPUS:1842691024

    SN - 0791836959

    SN - 9780791836958

    T3 - Proceedings of the ASME Summer Heat Transfer Conference

    SP - 117

    EP - 125

    BT - Proceedings of the 2003 ASME Summer Heat Transfer Conference, Volume 3

    ER -

    Vanka SP, Luo G, Glumac NG. Suppression of buoyancy in a prototypical CVD reactor by geometry modification. In Proceedings of the 2003 ASME Summer Heat Transfer Conference, Volume 3. 2003. p. 117-125. (Proceedings of the ASME Summer Heat Transfer Conference).