Surface charge evolution during early stage of thermal oxidation of silicon

Jianbai Wang, Paul Roman, Emil Kamieniecki, Jerzy Ruzyllo

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

A noncontact method which measures a density of electric charge on the semiconductor surface without bias, and hence, with no electric field in the oxide is used to monitor the evolution of surface charge during an early stage of thermal oxidation of silicon, i.e., from bare surface to oxide about 3 nm thick. It is shown that before positive charge associated with trivalent silicon in the SiO2/Si interface region is established, a surface charge is controlled by a negative charge most likely associated with nonbridging oxygen. A transition between these two regimes takes place in the oxide thickness range of about 1.5-2.5 nm. For oxide above 3 nm thick the surface charge is fully developed and remains constant with an increase of oxide thickness.

Original languageEnglish (US)
JournalElectrochemical and Solid-State Letters
Volume6
Issue number5
DOIs
StatePublished - May 1 2003

Fingerprint

Silicon
Surface charge
Oxides
Oxidation
oxidation
oxides
silicon
Electric charge
electric charge
Electric fields
Hot Temperature
Semiconductor materials
Oxygen
electric fields
oxygen

All Science Journal Classification (ASJC) codes

  • Electrochemistry
  • Materials Science(all)

Cite this

Wang, Jianbai ; Roman, Paul ; Kamieniecki, Emil ; Ruzyllo, Jerzy. / Surface charge evolution during early stage of thermal oxidation of silicon. In: Electrochemical and Solid-State Letters. 2003 ; Vol. 6, No. 5.
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Surface charge evolution during early stage of thermal oxidation of silicon. / Wang, Jianbai; Roman, Paul; Kamieniecki, Emil; Ruzyllo, Jerzy.

In: Electrochemical and Solid-State Letters, Vol. 6, No. 5, 01.05.2003.

Research output: Contribution to journalArticle

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