SURFACE CHEMICAL STUDIES OF OXIDES AND NITRIDES.

Carlo G. Pantano

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The application of surface analysis techniques for the study of fundamental surface and thin film phenomena is described. The topics covered relate to the processing and fabrication of electronic packages and include: evaporation/condensation during the thermal processing of glasses, hydration of glass surfaces and thin films, nitridation of silica films, diffusion behavior in oxides at low temperature, and impurity segregation in thin films. A wide variety of surface analytical methods are exemplified including Auger electron spectroscopy (AES), ion-scattering spectroscopy (ISS), nuclear reaction analysis (NRA), secondary-ion mass spectroscopy (SIMS) and x-ray photoelectron spectroscopy (XPS).

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposia Proceedings
PublisherMaterials Research Soc
Pages303-316
Number of pages14
ISBN (Print)0931837057
StatePublished - Dec 1 1985

Publication series

NameMaterials Research Society Symposia Proceedings
Volume40
ISSN (Print)0272-9172

Fingerprint

Nitrides
Oxides
nitrides
Thin films
oxides
Thermal processing (foods)
Spectroscopy
Ions
Glass
Nitridation
Nuclear reactions
thin films
Surface analysis
Auger electron spectroscopy
Photoelectron spectroscopy
Silicon Dioxide
Hydration
glass
Condensation
Evaporation

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Pantano, C. G. (1985). SURFACE CHEMICAL STUDIES OF OXIDES AND NITRIDES. In Materials Research Society Symposia Proceedings (pp. 303-316). (Materials Research Society Symposia Proceedings; Vol. 40). Materials Research Soc.
Pantano, Carlo G. / SURFACE CHEMICAL STUDIES OF OXIDES AND NITRIDES. Materials Research Society Symposia Proceedings. Materials Research Soc, 1985. pp. 303-316 (Materials Research Society Symposia Proceedings).
@inproceedings{ec233323746f44fd9e18e4e797f7bb7d,
title = "SURFACE CHEMICAL STUDIES OF OXIDES AND NITRIDES.",
abstract = "The application of surface analysis techniques for the study of fundamental surface and thin film phenomena is described. The topics covered relate to the processing and fabrication of electronic packages and include: evaporation/condensation during the thermal processing of glasses, hydration of glass surfaces and thin films, nitridation of silica films, diffusion behavior in oxides at low temperature, and impurity segregation in thin films. A wide variety of surface analytical methods are exemplified including Auger electron spectroscopy (AES), ion-scattering spectroscopy (ISS), nuclear reaction analysis (NRA), secondary-ion mass spectroscopy (SIMS) and x-ray photoelectron spectroscopy (XPS).",
author = "Pantano, {Carlo G.}",
year = "1985",
month = "12",
day = "1",
language = "English (US)",
isbn = "0931837057",
series = "Materials Research Society Symposia Proceedings",
publisher = "Materials Research Soc",
pages = "303--316",
booktitle = "Materials Research Society Symposia Proceedings",

}

Pantano, CG 1985, SURFACE CHEMICAL STUDIES OF OXIDES AND NITRIDES. in Materials Research Society Symposia Proceedings. Materials Research Society Symposia Proceedings, vol. 40, Materials Research Soc, pp. 303-316.

SURFACE CHEMICAL STUDIES OF OXIDES AND NITRIDES. / Pantano, Carlo G.

Materials Research Society Symposia Proceedings. Materials Research Soc, 1985. p. 303-316 (Materials Research Society Symposia Proceedings; Vol. 40).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - SURFACE CHEMICAL STUDIES OF OXIDES AND NITRIDES.

AU - Pantano, Carlo G.

PY - 1985/12/1

Y1 - 1985/12/1

N2 - The application of surface analysis techniques for the study of fundamental surface and thin film phenomena is described. The topics covered relate to the processing and fabrication of electronic packages and include: evaporation/condensation during the thermal processing of glasses, hydration of glass surfaces and thin films, nitridation of silica films, diffusion behavior in oxides at low temperature, and impurity segregation in thin films. A wide variety of surface analytical methods are exemplified including Auger electron spectroscopy (AES), ion-scattering spectroscopy (ISS), nuclear reaction analysis (NRA), secondary-ion mass spectroscopy (SIMS) and x-ray photoelectron spectroscopy (XPS).

AB - The application of surface analysis techniques for the study of fundamental surface and thin film phenomena is described. The topics covered relate to the processing and fabrication of electronic packages and include: evaporation/condensation during the thermal processing of glasses, hydration of glass surfaces and thin films, nitridation of silica films, diffusion behavior in oxides at low temperature, and impurity segregation in thin films. A wide variety of surface analytical methods are exemplified including Auger electron spectroscopy (AES), ion-scattering spectroscopy (ISS), nuclear reaction analysis (NRA), secondary-ion mass spectroscopy (SIMS) and x-ray photoelectron spectroscopy (XPS).

UR - http://www.scopus.com/inward/record.url?scp=0022317655&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0022317655&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0022317655

SN - 0931837057

T3 - Materials Research Society Symposia Proceedings

SP - 303

EP - 316

BT - Materials Research Society Symposia Proceedings

PB - Materials Research Soc

ER -

Pantano CG. SURFACE CHEMICAL STUDIES OF OXIDES AND NITRIDES. In Materials Research Society Symposia Proceedings. Materials Research Soc. 1985. p. 303-316. (Materials Research Society Symposia Proceedings).