Synthesis science of SrRuO3 and CaRuO3 epitaxial films with high residual resistivity ratios

Hari P. Nair, Yang Liu, Jacob P. Ruf, Nathaniel J. Schreiber, Shunli Shang, David J. Baek, Berit H. Goodge, Lena F. Kourkoutis, Zi-kui Liu, Kyle M. Shen, Darrell G. Schlom

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Epitaxial SrRuO3 and CaRuO3 films were grown under an excess flux of elemental ruthenium in an adsorption-controlled regime by molecular-beam epitaxy (MBE), where the excess volatile RuOx (x = 2 or 3) desorbs from the growth front leaving behind a single-phase film. By growing in this regime, we were able to achieve SrRuO3 and CaRuO3 films with residual resistivity ratios (ρ300 K4 K) of 76 and 75, respectively. A combined phase stability diagram based on the thermodynamics of MBE (TOMBE) growth, termed a TOMBE diagram, is employed to provide improved guidance for the growth of complex materials by MBE.

Original languageEnglish (US)
Article number046101
JournalAPL Materials
Volume6
Issue number4
DOIs
StatePublished - Apr 1 2018

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Epitaxial films
Molecular beam epitaxy
Thermodynamics
Ruthenium
Phase stability
Fluxes
Adsorption

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Engineering(all)

Cite this

Nair, H. P., Liu, Y., Ruf, J. P., Schreiber, N. J., Shang, S., Baek, D. J., ... Schlom, D. G. (2018). Synthesis science of SrRuO3 and CaRuO3 epitaxial films with high residual resistivity ratios. APL Materials, 6(4), [046101]. https://doi.org/10.1063/1.5023477
Nair, Hari P. ; Liu, Yang ; Ruf, Jacob P. ; Schreiber, Nathaniel J. ; Shang, Shunli ; Baek, David J. ; Goodge, Berit H. ; Kourkoutis, Lena F. ; Liu, Zi-kui ; Shen, Kyle M. ; Schlom, Darrell G. / Synthesis science of SrRuO3 and CaRuO3 epitaxial films with high residual resistivity ratios. In: APL Materials. 2018 ; Vol. 6, No. 4.
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Nair, HP, Liu, Y, Ruf, JP, Schreiber, NJ, Shang, S, Baek, DJ, Goodge, BH, Kourkoutis, LF, Liu, Z, Shen, KM & Schlom, DG 2018, 'Synthesis science of SrRuO3 and CaRuO3 epitaxial films with high residual resistivity ratios', APL Materials, vol. 6, no. 4, 046101. https://doi.org/10.1063/1.5023477

Synthesis science of SrRuO3 and CaRuO3 epitaxial films with high residual resistivity ratios. / Nair, Hari P.; Liu, Yang; Ruf, Jacob P.; Schreiber, Nathaniel J.; Shang, Shunli; Baek, David J.; Goodge, Berit H.; Kourkoutis, Lena F.; Liu, Zi-kui; Shen, Kyle M.; Schlom, Darrell G.

In: APL Materials, Vol. 6, No. 4, 046101, 01.04.2018.

Research output: Contribution to journalArticle

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AU - Nair, Hari P.

AU - Liu, Yang

AU - Ruf, Jacob P.

AU - Schreiber, Nathaniel J.

AU - Shang, Shunli

AU - Baek, David J.

AU - Goodge, Berit H.

AU - Kourkoutis, Lena F.

AU - Liu, Zi-kui

AU - Shen, Kyle M.

AU - Schlom, Darrell G.

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