Tailoring the wettability of glass using a double-dielectric barrier discharge reactor

Quang Hung Trinh, Md Mokter Hossain, Seong H. Kim, Young Sun Mok

Research output: Contribution to journalArticle

5 Scopus citations

Abstract

A double dielectric barrier discharge reactor operated at a low power frequency of 400 Hz and atmospheric pressure was utilized for regulating the wettability of glass surface. The hydrophobic treatment was performed by plasma polymerization of tetramethylsilane (TMS, in argon gas). The obtained results showed that the TMS coatings formed on the glass substrates without oxygen addition were smooth, uniform films with the maximum water contact angle (WCA) of about 106°, which were similar to those obtained by low pressure, high power frequency plasmas reported in the literature. The addition of oxygen into TMS/Ar plasma gas decreased the WCA and induced the formation of SiOSi and/or SiOC linkages, which dominated the existence of Si(CH2)nSi network formed in TMS/Ar (without oxygen) plasma.

Original languageEnglish (US)
Article numbere00522
JournalHeliyon
Volume4
Issue number1
DOIs
StatePublished - Jan 2018

All Science Journal Classification (ASJC) codes

  • General

Fingerprint Dive into the research topics of 'Tailoring the wettability of glass using a double-dielectric barrier discharge reactor'. Together they form a unique fingerprint.

  • Cite this