TEM characterisation of an interfacial layer between silicon and glass

S. C. Cheng, Carlo G. Pantano, A. K. Kalkan, S. H. Bae, S. J. Fonash

Research output: Contribution to journalArticle

Abstract

An interfacial layer has been observed between deposited silicon thin films and glass substrates. Experimental evidence indicates that this thin interfacial layer is formed due to the use of the RCA standard cleaning procedure on Corning Code 7059 and 1737 glasses. In this study cross sectional TEM and EDX analysis on Corning Code 7059 glass shows that this layer is silica rich and verifies its formation due to selective leaching of barium, alumina and boron in the glass surface. The layer shows an abrupt boundary with the glass substrate but there is a composition gradient within the glass substrate that extends ∼50 nm beyond the interface revealed in the TEM micrograph. This interfacial layer is of technological interest because it can provide a physical barrier and/or chemical sink for the out diffusion of impurities.

Original languageEnglish (US)
Pages (from-to)136-139
Number of pages4
JournalPhysics and Chemistry of Glasses
Volume41
Issue number3
StatePublished - Dec 1 2000

Fingerprint

Silicon
Transmission electron microscopy
Glass
transmission electron microscopy
glass
silicon
Substrates
Boron
Aluminum Oxide
Barium
leaching
sinks
Silicon Dioxide
cleaning
Leaching
barium
Energy dispersive spectroscopy
Cleaning
boron
Alumina

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Physical and Theoretical Chemistry

Cite this

Cheng, S. C., Pantano, C. G., Kalkan, A. K., Bae, S. H., & Fonash, S. J. (2000). TEM characterisation of an interfacial layer between silicon and glass. Physics and Chemistry of Glasses, 41(3), 136-139.
Cheng, S. C. ; Pantano, Carlo G. ; Kalkan, A. K. ; Bae, S. H. ; Fonash, S. J. / TEM characterisation of an interfacial layer between silicon and glass. In: Physics and Chemistry of Glasses. 2000 ; Vol. 41, No. 3. pp. 136-139.
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Cheng, SC, Pantano, CG, Kalkan, AK, Bae, SH & Fonash, SJ 2000, 'TEM characterisation of an interfacial layer between silicon and glass', Physics and Chemistry of Glasses, vol. 41, no. 3, pp. 136-139.

TEM characterisation of an interfacial layer between silicon and glass. / Cheng, S. C.; Pantano, Carlo G.; Kalkan, A. K.; Bae, S. H.; Fonash, S. J.

In: Physics and Chemistry of Glasses, Vol. 41, No. 3, 01.12.2000, p. 136-139.

Research output: Contribution to journalArticle

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T1 - TEM characterisation of an interfacial layer between silicon and glass

AU - Cheng, S. C.

AU - Pantano, Carlo G.

AU - Kalkan, A. K.

AU - Bae, S. H.

AU - Fonash, S. J.

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AB - An interfacial layer has been observed between deposited silicon thin films and glass substrates. Experimental evidence indicates that this thin interfacial layer is formed due to the use of the RCA standard cleaning procedure on Corning Code 7059 and 1737 glasses. In this study cross sectional TEM and EDX analysis on Corning Code 7059 glass shows that this layer is silica rich and verifies its formation due to selective leaching of barium, alumina and boron in the glass surface. The layer shows an abrupt boundary with the glass substrate but there is a composition gradient within the glass substrate that extends ∼50 nm beyond the interface revealed in the TEM micrograph. This interfacial layer is of technological interest because it can provide a physical barrier and/or chemical sink for the out diffusion of impurities.

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Cheng SC, Pantano CG, Kalkan AK, Bae SH, Fonash SJ. TEM characterisation of an interfacial layer between silicon and glass. Physics and Chemistry of Glasses. 2000 Dec 1;41(3):136-139.