Fingerprint
Dive into the research topics of 'Temperature dependence of the etch rate and selectivity of silicon nitride over silicon dioxide in remote plasma NF3/Cl2'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
Temperature dependence of the etch rate and selectivity of silicon nitride over silicon dioxide in remote plasma NF3/Cl2
J. Staffa, D. Hwang, B. Luther, J. Ruzyllo, R. Grant
Research output: Contribution to journal › Article › peer-review
3
Scopus
citations