Template-guided self-assembly of dots using plasma lithography

Michael Junkin, Jennifer Watson, Jonathan P. Vande Geest, Pak Kin Wong

Research output: Contribution to journalArticle

44 Scopus citations

Abstract

A study was conducted to demonstrate the performance of plasma lithography as a technique to pattern different surfaces to guide the self-assembly of quantum dots and other nanoscale building blocks. Plasma lithography was used to achieve pattern resolution of 100nm to 1 cm in size using simple procedures and equipment and to provide control over the resultant quantum-dot density. The fabrication method involved creating a nanoscale mold with 3D topography that when placed in contact with a substrate can shield selective areas of the substrate from the modification of a plasma, while allowed plasma surface treatment with other exposed areas. 3D molds were placed on polystyrene substrates during plasma treatment to spatially functionalize the polystyrene surface to create templates for self-assembly of quantum dots. It was concluded that the plasma lithography technique can be used for biomedical, material science, and nanophotonic applications.

Original languageEnglish (US)
Pages (from-to)1247-1251
Number of pages5
JournalAdvanced Materials
Volume21
Issue number12
DOIs
StatePublished - Mar 26 2009

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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