The effect of nitric oxide anneals on silicon vacancies at and very near the interface of 4H SiC metal oxide semiconducting field effect transistors using electrically detected magnetic resonance

C. J. Cochrane, P. M. Lenahan, A. J. Lelis

Research output: Contribution to journalArticle

18 Scopus citations

Abstract

We use three electrically detected magnetic resonance (EDMR) approaches to explore nitric oxide (NO) annealing in 4H SiC metal-oxide-semiconductor field-effect transistors (MOSFETs). One approach is sensitive to defects at the interface and those extending into the SiC. Two of these approaches are particularly sensitive to SiC/SiO2 interface defects. They show that NO anneals decrease the EDMR response. Since this and earlier studies indicate the ubiquitous presence of silicon vacancy centers in SiC MOSFETs, our results provide strong circumstantial evidence that these defects play an important role in limiting device performance and that NO anneals are effective in reducing their populations.

Original languageEnglish (US)
Article number193507
JournalApplied Physics Letters
Volume102
Issue number19
DOIs
StatePublished - May 13 2013

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this