The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy

G. L. Fisher; A. Hooper; R. L. Opila; D. R. Jung; D. L. Allara; N. Winograd

doi:10.1016/s0368-2048(98)00283-7

The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy

G. L. Fisher, A. Hooper, R. L. Opila, D. R. Jung, D. L. Allara, N. Winograd

Research output: Contribution to journal › Article › peer-review

24 Scopus citations

Abstract

The deposition of 2 Å of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH₂)₁₅CO₂CH₃) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering.

Original language	English (US)
Pages (from-to)	139-148
Number of pages	10
Journal	Journal of Electron Spectroscopy and Related Phenomena
Volume	98-99
DOIs	https://doi.org/10.1016/s0368-2048(98)00283-7
State	Published - Jan 1999

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Radiation
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Spectroscopy
Physical and Theoretical Chemistry

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10.1016/s0368-2048(98)00283-7

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Fisher, G. L., Hooper, A., Opila, R. L., Jung, D. R., Allara, D. L., & Winograd, N. (1999). The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. Journal of Electron Spectroscopy and Related Phenomena, 98-99, 139-148. https://doi.org/10.1016/s0368-2048(98)00283-7

Fisher, G. L. ; Hooper, A. ; Opila, R. L. ; Jung, D. R. ; Allara, D. L. ; Winograd, N. / The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. In: Journal of Electron Spectroscopy and Related Phenomena. 1999 ; Vol. 98-99. pp. 139-148.

@article{41ee58472ffc4ec0964733675137f107,

title = "The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy",

abstract = "The deposition of 2 {\AA} of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH2)15CO2CH3) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering.",

author = "Fisher, {G. L.} and A. Hooper and Opila, {R. L.} and Jung, {D. R.} and Allara, {D. L.} and N. Winograd",

year = "1999",

month = jan,

doi = "10.1016/s0368-2048(98)00283-7",

language = "English (US)",

volume = "98-99",

pages = "139--148",

journal = "Journal of Electron Spectroscopy and Related Phenomena",

issn = "0368-2048",

publisher = "Elsevier",

}

Fisher, GL, Hooper, A, Opila, RL, Jung, DR, Allara, DL & Winograd, N 1999, 'The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy', Journal of Electron Spectroscopy and Related Phenomena, vol. 98-99, pp. 139-148. https://doi.org/10.1016/s0368-2048(98)00283-7

The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. / Fisher, G. L.; Hooper, A.; Opila, R. L.; Jung, D. R.; Allara, D. L.; Winograd, N.

In: Journal of Electron Spectroscopy and Related Phenomena, Vol. 98-99, 01.1999, p. 139-148.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy

AU - Fisher, G. L.

AU - Hooper, A.

AU - Opila, R. L.

AU - Jung, D. R.

AU - Allara, D. L.

AU - Winograd, N.

PY - 1999/1

Y1 - 1999/1

N2 - The deposition of 2 Å of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH2)15CO2CH3) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering.

AB - The deposition of 2 Å of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH2)15CO2CH3) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering.

UR - http://www.scopus.com/inward/record.url?scp=0006678602&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0006678602&partnerID=8YFLogxK

U2 - 10.1016/s0368-2048(98)00283-7

DO - 10.1016/s0368-2048(98)00283-7

M3 - Article

AN - SCOPUS:0006678602

VL - 98-99

SP - 139

EP - 148

JO - Journal of Electron Spectroscopy and Related Phenomena

JF - Journal of Electron Spectroscopy and Related Phenomena

SN - 0368-2048

ER -

Fisher GL, Hooper A, Opila RL, Jung DR, Allara DL, Winograd N. The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. Journal of Electron Spectroscopy and Related Phenomena. 1999 Jan;98-99:139-148. https://doi.org/10.1016/s0368-2048(98)00283-7