The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy

G. L. Fisher; A. Hooper; R. L. Opila; D. R. Jung; D. L. Allara; N. Winograd

doi:10.1016/s0368-2048(98)00283-7

The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy

G. L. Fisher, A. Hooper, R. L. Opila, D. R. Jung, D. L. Allara, N. Winograd

Research output: Contribution to journal › Article

26 Scopus citations

Abstract

The deposition of 2 Å of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH₂)₁₅CO₂CH₃) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering.

Original language	English (US)
Pages (from-to)	139-148
Number of pages	10
Journal	Journal of Electron Spectroscopy and Related Phenomena
Volume	98-99
DOIs	https://doi.org/10.1016/s0368-2048(98)00283-7
State	Published - Jan 1999

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All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Radiation
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Spectroscopy
Physical and Theoretical Chemistry

Cite this

Fisher, G. L., Hooper, A., Opila, R. L., Jung, D. R., Allara, D. L., & Winograd, N. (1999). The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. Journal of Electron Spectroscopy and Related Phenomena, 98-99, 139-148. https://doi.org/10.1016/s0368-2048(98)00283-7

Fisher, G. L. ; Hooper, A. ; Opila, R. L. ; Jung, D. R. ; Allara, D. L. ; Winograd, N. / The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. In: Journal of Electron Spectroscopy and Related Phenomena. 1999 ; Vol. 98-99. pp. 139-148.

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title = "The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy",

abstract = "The deposition of 2 {\AA} of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH2)15CO2CH3) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering.",

author = "Fisher, {G. L.} and A. Hooper and Opila, {R. L.} and Jung, {D. R.} and Allara, {D. L.} and N. Winograd",

year = "1999",

month = jan,

doi = "10.1016/s0368-2048(98)00283-7",

language = "English (US)",

volume = "98-99",

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journal = "Journal of Electron Spectroscopy and Related Phenomena",

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Fisher, GL, Hooper, A, Opila, RL, Jung, DR, Allara, DL & Winograd, N 1999, 'The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy', Journal of Electron Spectroscopy and Related Phenomena, vol. 98-99, pp. 139-148. https://doi.org/10.1016/s0368-2048(98)00283-7

The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. / Fisher, G. L.; Hooper, A.; Opila, R. L.; Jung, D. R.; Allara, D. L.; Winograd, N.

In: Journal of Electron Spectroscopy and Related Phenomena, Vol. 98-99, 01.1999, p. 139-148.

Research output: Contribution to journal › Article

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T1 - The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy

AU - Fisher, G. L.

AU - Hooper, A.

AU - Opila, R. L.

AU - Jung, D. R.

AU - Allara, D. L.

AU - Winograd, N.

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AB - The deposition of 2 Å of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH2)15CO2CH3) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering.

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Fisher GL, Hooper A, Opila RL, Jung DR, Allara DL, Winograd N. The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. Journal of Electron Spectroscopy and Related Phenomena. 1999 Jan;98-99:139-148. https://doi.org/10.1016/s0368-2048(98)00283-7

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10.1016/s0368-2048(98)00283-7