The role of crystallographic orientation on the forces generated in ultra-precision grinding of anisotropic materials such as monocrystalline silicon

Eric Russell Marsh, R. Ryan Vallance

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    This work presents a system of measuring grinding forces in precision applications. Several experiments demonstrate the performance in monitoring diamond wheel dressing, detecting workpiece contact, and process monitoring. The system appears promising for monitoring precision wafer grinding since this approach provides excellent sensitivity, high signal resolution, and good bandwidth.

    Original languageEnglish (US)
    Title of host publicationProceedings of the 21st Annual ASPE Meeting, ASPE 2006
    StatePublished - 2006
    Event21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006 - Monterey, CA, United States
    Duration: Oct 15 2006Oct 20 2006

    Other

    Other21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006
    CountryUnited States
    CityMonterey, CA
    Period10/15/0610/20/06

    All Science Journal Classification (ASJC) codes

    • Mechanical Engineering

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