Theory and New Applications of Ex Situ Lift Out

Lucille A. Giannuzzi, Zhiyang Yu, Denise Yin, Martin P. Harmer, Qiang Xu, Noel S. Smith, Lisa Chan, Jon Hiller, Dustin Hess, Trevor Clark

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

The ex situ lift out (EXLO) adhesion forces are reviewed and new applications of EXLO for focused ion beam (FIB)-prepared specimens are described. EXLO is used to manipulate electron transparent specimens on microelectromechanical systems carrier devices designed for in situ electron microscope analysis. A new patented grid design without a support film is described for EXLO. This new slotted grid design provides a surface for holding the specimen in place and also allows for post lift out processing. Specimens may be easily manipulated into a backside orientation to reduce FIB curtaining artifacts with this slotted grid. Large EXLO specimens can be manipulated from Xe+ plasma FIB prepared specimens. Finally, applications of EXLO and manipulation of FIB specimens using a vacuum probe lift out method are shown. The vacuum probe provides more control for placing specimens on the new slotted grids and also allows for easy manipulation into a backside configuration.

Original languageEnglish (US)
Pages (from-to)1034-1048
Number of pages15
JournalMicroscopy and Microanalysis
Volume21
Issue number4
DOIs
StatePublished - Apr 30 2015

All Science Journal Classification (ASJC) codes

  • Instrumentation

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