Thermally tunable VO2-SiO2 nanocomposite thin-film capacitors

Yifei Sun, K. V.L.V. Narayanachari, Chenghao Wan, Xing Sun, Haiyan Wang, Kayla A. Cooley, Suzanne E. Mohney, Doug White, Amy Duwel, Mikhail A. Kats, Shriram Ramanathan

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Abstract

We present a study of co-sputtered VO2-SiO2 nanocomposite dielectric thin-film media possessing continuous temperature tunability of the dielectric constant. The smooth thermal tunability is a result of the insulator-metal transition in the VO2 inclusions dispersed within an insulating matrix. We present a detailed comparison of the dielectric characteristics of this nanocomposite with those of a VO2 control layer and of VO2/SiO2 laminate multilayers of comparable overall thickness. We demonstrated a nanocomposite capacitor that has a thermal capacitance tunability of ∼60% between 25 °C and 100 °C at 1 MHz, with low leakage current. Such thermally tunable capacitors could find potential use in applications such as sensing, thermal cloaks, and phase-change energy storage devices.

Original languageEnglish (US)
Article number114103
JournalJournal of Applied Physics
Volume123
Issue number11
DOIs
StatePublished - Mar 21 2018

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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    Sun, Y., Narayanachari, K. V. L. V., Wan, C., Sun, X., Wang, H., Cooley, K. A., Mohney, S. E., White, D., Duwel, A., Kats, M. A., & Ramanathan, S. (2018). Thermally tunable VO2-SiO2 nanocomposite thin-film capacitors. Journal of Applied Physics, 123(11), [114103]. https://doi.org/10.1063/1.5011641