Thermochemical Nitridation of Microporous Silica Films in Ammonia

RICHARD K. BROW, Carlo G. Pantano

Research output: Contribution to journalArticle

72 Citations (Scopus)

Abstract

Microporous silicon dioxide thin Films were deposited on silicon substrates from a solution of tetraethoxysilane, ethanol, and water. These were converted to dense oxynitrides through a high‐temperature reaction with ammonia. The ammonia treatments yielded amorphous, compositionally homogeneous films with overall nitrogen contents ranging up to 40 mol%. For ammonia treatments below 800°C, nitrogen was incorporated into the films as an amine species, whereas higher temperature treatments produced a nitride material.

Original languageEnglish (US)
Pages (from-to)9-14
Number of pages6
JournalJournal of the American Ceramic Society
Volume70
Issue number1
DOIs
StatePublished - Jan 1 1987

Fingerprint

Nitridation
Ammonia
Silicon Dioxide
Silica
Nitrogen
Silicon
Nitrides
Amines
Ethanol
Thin films
Water
Polymers
Substrates
Temperature

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Materials Chemistry

Cite this

BROW, RICHARD K. ; Pantano, Carlo G. / Thermochemical Nitridation of Microporous Silica Films in Ammonia. In: Journal of the American Ceramic Society. 1987 ; Vol. 70, No. 1. pp. 9-14.
@article{18f0544511f84df2a464a9faecd06996,
title = "Thermochemical Nitridation of Microporous Silica Films in Ammonia",
abstract = "Microporous silicon dioxide thin Films were deposited on silicon substrates from a solution of tetraethoxysilane, ethanol, and water. These were converted to dense oxynitrides through a high‐temperature reaction with ammonia. The ammonia treatments yielded amorphous, compositionally homogeneous films with overall nitrogen contents ranging up to 40 mol{\%}. For ammonia treatments below 800°C, nitrogen was incorporated into the films as an amine species, whereas higher temperature treatments produced a nitride material.",
author = "BROW, {RICHARD K.} and Pantano, {Carlo G.}",
year = "1987",
month = "1",
day = "1",
doi = "10.1111/j.1151-2916.1987.tb04845.x",
language = "English (US)",
volume = "70",
pages = "9--14",
journal = "Journal of the American Ceramic Society",
issn = "0002-7820",
publisher = "Wiley-Blackwell",
number = "1",

}

Thermochemical Nitridation of Microporous Silica Films in Ammonia. / BROW, RICHARD K.; Pantano, Carlo G.

In: Journal of the American Ceramic Society, Vol. 70, No. 1, 01.01.1987, p. 9-14.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Thermochemical Nitridation of Microporous Silica Films in Ammonia

AU - BROW, RICHARD K.

AU - Pantano, Carlo G.

PY - 1987/1/1

Y1 - 1987/1/1

N2 - Microporous silicon dioxide thin Films were deposited on silicon substrates from a solution of tetraethoxysilane, ethanol, and water. These were converted to dense oxynitrides through a high‐temperature reaction with ammonia. The ammonia treatments yielded amorphous, compositionally homogeneous films with overall nitrogen contents ranging up to 40 mol%. For ammonia treatments below 800°C, nitrogen was incorporated into the films as an amine species, whereas higher temperature treatments produced a nitride material.

AB - Microporous silicon dioxide thin Films were deposited on silicon substrates from a solution of tetraethoxysilane, ethanol, and water. These were converted to dense oxynitrides through a high‐temperature reaction with ammonia. The ammonia treatments yielded amorphous, compositionally homogeneous films with overall nitrogen contents ranging up to 40 mol%. For ammonia treatments below 800°C, nitrogen was incorporated into the films as an amine species, whereas higher temperature treatments produced a nitride material.

UR - http://www.scopus.com/inward/record.url?scp=0023136416&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0023136416&partnerID=8YFLogxK

U2 - 10.1111/j.1151-2916.1987.tb04845.x

DO - 10.1111/j.1151-2916.1987.tb04845.x

M3 - Article

VL - 70

SP - 9

EP - 14

JO - Journal of the American Ceramic Society

JF - Journal of the American Ceramic Society

SN - 0002-7820

IS - 1

ER -