Thermochemical Nitridation of Microporous Silica Films in Ammonia

RICHARD K. BROW, CARLO G. PANTANO

Research output: Contribution to journalArticle

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Abstract

Microporous silicon dioxide thin Films were deposited on silicon substrates from a solution of tetraethoxysilane, ethanol, and water. These were converted to dense oxynitrides through a high‐temperature reaction with ammonia. The ammonia treatments yielded amorphous, compositionally homogeneous films with overall nitrogen contents ranging up to 40 mol%. For ammonia treatments below 800°C, nitrogen was incorporated into the films as an amine species, whereas higher temperature treatments produced a nitride material.

Original languageEnglish (US)
Pages (from-to)9-14
Number of pages6
JournalJournal of the American Ceramic Society
Volume70
Issue number1
DOIs
StatePublished - Jan 1987

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Materials Chemistry

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