Three-dimensional depth profiling of molecular structures

A. Wucher, J. Cheng, L. Zheng, Nicholas Winograd

Research output: Contribution to journalArticle

38 Citations (Scopus)

Abstract

Molecular time of flight secondary ion mass spectrometry (ToF-SIMS) imaging and cluster ion beam erosion are combined to perform a three-dimensional chemical analysis of molecular films. The resulting dataset allows a number of artifacts inherent in sputter depth profiling to be assessed. These artifacts arise from lateral inhomogeneities of either the erosion rate or the sample itself. Using a test structure based on a trehalose film deposited on Si, we demonstrate that the "local" depth resolution may approach values which are close to the physical limit introduced by the information depth of the (static) ToF-SIMS method itself.

Original languageEnglish (US)
Pages (from-to)1835-1842
Number of pages8
JournalAnalytical and Bioanalytical Chemistry
Volume393
Issue number8
DOIs
StatePublished - Apr 1 2009

Fingerprint

Secondary Ion Mass Spectrometry
Depth profiling
Secondary ion mass spectrometry
Molecular Structure
Artifacts
Molecular structure
Erosion
Trehalose
Ion beams
Ions
Imaging techniques
Chemical analysis
Datasets

All Science Journal Classification (ASJC) codes

  • Analytical Chemistry
  • Biochemistry

Cite this

Wucher, A. ; Cheng, J. ; Zheng, L. ; Winograd, Nicholas. / Three-dimensional depth profiling of molecular structures. In: Analytical and Bioanalytical Chemistry. 2009 ; Vol. 393, No. 8. pp. 1835-1842.
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Three-dimensional depth profiling of molecular structures. / Wucher, A.; Cheng, J.; Zheng, L.; Winograd, Nicholas.

In: Analytical and Bioanalytical Chemistry, Vol. 393, No. 8, 01.04.2009, p. 1835-1842.

Research output: Contribution to journalArticle

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