Three-dimensional molecular imaging using mass spectrometry and atomic force microscopy

Andreas Wucher, Juan Cheng, Leiliang Zheng, David Willingham, Nicholas Winograd

Research output: Contribution to journalArticlepeer-review

27 Scopus citations


We combine imaging ToF-SIMS depth profiling and wide area atomic force microscopy to analyze a test structure consisting of a 300 nm trehalose film deposited on a Si substrate and pre-structured by means of a focused 15-keV Ga + ion beam. Depth profiling is performed using a 40-keV C 60 + cluster ion beam for erosion and mass spectral data acquisition. A generic protocol for depth axis calibration is described which takes into account both lateral and in-depth variations of the erosion rate. By extrapolation towards zero analyzed lateral area, an "intrinsic" depth resolution of about 8 nm is found which appears to be characteristic of the cluster-surface interaction process.

Original languageEnglish (US)
Pages (from-to)984-986
Number of pages3
JournalApplied Surface Science
Issue number4
StatePublished - Dec 15 2008

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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