Three-dimensional molecular imaging using mass spectrometry and atomic force microscopy

Andreas Wucher, Juan Cheng, Leiliang Zheng, David Willingham, Nicholas Winograd

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

We combine imaging ToF-SIMS depth profiling and wide area atomic force microscopy to analyze a test structure consisting of a 300 nm trehalose film deposited on a Si substrate and pre-structured by means of a focused 15-keV Ga + ion beam. Depth profiling is performed using a 40-keV C 60 + cluster ion beam for erosion and mass spectral data acquisition. A generic protocol for depth axis calibration is described which takes into account both lateral and in-depth variations of the erosion rate. By extrapolation towards zero analyzed lateral area, an "intrinsic" depth resolution of about 8 nm is found which appears to be characteristic of the cluster-surface interaction process.

Original languageEnglish (US)
Pages (from-to)984-986
Number of pages3
JournalApplied Surface Science
Volume255
Issue number4
DOIs
StatePublished - Dec 15 2008

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Molecular imaging
Depth profiling
Ion beams
Mass spectrometry
Erosion
Atomic force microscopy
Trehalose
Secondary ion mass spectrometry
Extrapolation
Data acquisition
Calibration
Imaging techniques
Substrates

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films

Cite this

Wucher, Andreas ; Cheng, Juan ; Zheng, Leiliang ; Willingham, David ; Winograd, Nicholas. / Three-dimensional molecular imaging using mass spectrometry and atomic force microscopy. In: Applied Surface Science. 2008 ; Vol. 255, No. 4. pp. 984-986.
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Three-dimensional molecular imaging using mass spectrometry and atomic force microscopy. / Wucher, Andreas; Cheng, Juan; Zheng, Leiliang; Willingham, David; Winograd, Nicholas.

In: Applied Surface Science, Vol. 255, No. 4, 15.12.2008, p. 984-986.

Research output: Contribution to journalArticle

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