Tungsten CMP: Application of mixed potential theory to the tungsten/iodate system

Research output: Contribution to conferencePaper

Abstract

Using potentiodynamic polarization, the rotating disk electrode technique, and solution analysis, the effects of pH and iodate concentration on the rate of tungsten (W) corrosion were investigated at the corrosion potential. Based on mixed potential theory, the corrosion current with and without abrasion was estimated. The estimated corrosion current was found to be anodic-process- controlled in the absence of abrasion. However, in the presence of abrasion, Tafel behavior was assumed to continue at the corrosion potential and the estimated corrosion current density was observed to be cathodic-process- controlled. As the pH decreased and iodate concentration increased, the corrosion current density increased. The calculated W corrosion rate was only a small fraction of the reported W polishing rate.

Original languageEnglish (US)
Pages335-348
Number of pages14
StatePublished - Dec 1 2003
EventChemical Mechanical Planarization VI - Proceddings of the International Symposium - Orlando, FL., United States
Duration: Oct 12 2003Oct 17 2003

Other

OtherChemical Mechanical Planarization VI - Proceddings of the International Symposium
CountryUnited States
CityOrlando, FL.
Period10/12/0310/17/03

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Anik, M., & Osseo-Asare, K. A. (2003). Tungsten CMP: Application of mixed potential theory to the tungsten/iodate system. 335-348. Paper presented at Chemical Mechanical Planarization VI - Proceddings of the International Symposium, Orlando, FL., United States.