Tuning of sculptured-thin-film spectral-hole filters by postdeposition etching

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Abstract

Postdeposition chemical etching of spectral-hole filters, which were fabricated as chiral sculptured thin films with central 90-deg-twist defects, decreases the cross-sectional dimensions of the helical columns that such films comprise and blueshifts the spectral holes, thereby establishing the efficacy of postdeposition chemical etching as a means to tune the optical response characteristics of sculptured thin films.

Original languageEnglish (US)
Article number040507
JournalOptical Engineering
Volume46
Issue number4
DOIs
StatePublished - Apr 1 2007

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Engineering(all)

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