Ultra accuracy parallel electronic datum optical metrology system of systems

Xiang Wen Xiong, Wynn L. Bear, John T. Roth, Marco P. Schoen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Optical Metrology and Range Measurement, Coordinates Measuring System are one of the important bases of the modern manufacturing industry precise manufacture. In order to obtain more new measurement technology that a higher degree of intelligence, lower cost, operation more easily, all of us had undertaken extensive research. However, in the traditional measurement techniques, there are still not enough level of intelligent and complicated to operate, and other shortcomings. This paper generously provided an ultra accuracy parallel electronic datum optical metrology system of interconnected systems for manufacturing measurement and processing monitoring, etc. The method of the electronic parallel datum is to calculate by a stereo angle between the two beams of light with inclination simulating parameters of an object and successfully replace the 6-DOF mechanical datum of the related work piece by being pre-set in the demanding related work piece and system. Furthermore, it is the intelligent direct reading of 6-DOF mechanical datum and parameter storage function of the technique, and greatly improve the benefit performance of the nifty system and at the same time offer the available process control method and can be used for all manufacturing industrial, including the micro-fabrication and micro-manufacturing, etc. It can be used for ultra accuracy manufacturing environment, because the diameter of the laser beam can reach 100 nm and ion beam diameter even reached the extreme limit accuracy of 2nm. We use micro-staggered approach to vastly improve the accuracy of interconnected system. It means that the old Electronic Parallel Datum receiver has the tidiness arrangement and alignment in dot matrices upper and lower. The micro-staggered spacing is 2nm and beyond.

Original languageEnglish (US)
Title of host publicationAdvanced Materials and Devices for Sensing and Imaging III
DOIs
Publication statusPublished - Jun 26 2008
EventAdvanced Materials and Devices for Sensing and Imaging III - Beijing, China
Duration: Nov 12 2007Nov 14 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6829
ISSN (Print)0277-786X

Other

OtherAdvanced Materials and Devices for Sensing and Imaging III
CountryChina
CityBeijing
Period11/12/0711/14/07

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Xiong, X. W., Bear, W. L., Roth, J. T., & Schoen, M. P. (2008). Ultra accuracy parallel electronic datum optical metrology system of systems. In Advanced Materials and Devices for Sensing and Imaging III [682925] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6829). https://doi.org/10.1117/12.765821