Use of e-beam written cgh in optical pattern recognition

R. A. Athale, C. L. Giles, J. A. Blodgett

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The E-beam pattern generators, developed for making masks for integrated circuits with submicron features, are extremely attractive for producing high quality computer generated holograms (CGH). The procedure for making the E-beam written CGH along with its properties will be described. Application of these CGH's to spatial frequency multiplexed optical processors for pattern recognition will be discussed.

Original languageEnglish (US)
Pages (from-to)48-53
Number of pages6
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume437
DOIs
StatePublished - Oct 26 1983

Fingerprint

Hologram
Holograms
Electron Beam
pattern recognition
Pattern Recognition
Pattern recognition
Integrated Circuits
Mask
integrated circuits
Integrated circuits
central processing units
Masks
masks
generators
Generator

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

@article{edea9d5af2e2405faa5fd3ff37422a6a,
title = "Use of e-beam written cgh in optical pattern recognition",
abstract = "The E-beam pattern generators, developed for making masks for integrated circuits with submicron features, are extremely attractive for producing high quality computer generated holograms (CGH). The procedure for making the E-beam written CGH along with its properties will be described. Application of these CGH's to spatial frequency multiplexed optical processors for pattern recognition will be discussed.",
author = "Athale, {R. A.} and Giles, {C. L.} and Blodgett, {J. A.}",
year = "1983",
month = "10",
day = "26",
doi = "10.1117/12.937129",
language = "English (US)",
volume = "437",
pages = "48--53",
journal = "Proceedings of SPIE - The International Society for Optical Engineering",
issn = "0277-786X",
publisher = "SPIE",

}

Use of e-beam written cgh in optical pattern recognition. / Athale, R. A.; Giles, C. L.; Blodgett, J. A.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 437, 26.10.1983, p. 48-53.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Use of e-beam written cgh in optical pattern recognition

AU - Athale, R. A.

AU - Giles, C. L.

AU - Blodgett, J. A.

PY - 1983/10/26

Y1 - 1983/10/26

N2 - The E-beam pattern generators, developed for making masks for integrated circuits with submicron features, are extremely attractive for producing high quality computer generated holograms (CGH). The procedure for making the E-beam written CGH along with its properties will be described. Application of these CGH's to spatial frequency multiplexed optical processors for pattern recognition will be discussed.

AB - The E-beam pattern generators, developed for making masks for integrated circuits with submicron features, are extremely attractive for producing high quality computer generated holograms (CGH). The procedure for making the E-beam written CGH along with its properties will be described. Application of these CGH's to spatial frequency multiplexed optical processors for pattern recognition will be discussed.

UR - http://www.scopus.com/inward/record.url?scp=0020873781&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0020873781&partnerID=8YFLogxK

U2 - 10.1117/12.937129

DO - 10.1117/12.937129

M3 - Article

AN - SCOPUS:0020873781

VL - 437

SP - 48

EP - 53

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

SN - 0277-786X

ER -