Use of e-beam written cgh in optical pattern recognition

R. A. Athale, C. L. Giles, J. A. Blodgett

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

The E-beam pattern generators, developed for making masks for integrated circuits with submicron features, are extremely attractive for producing high quality computer generated holograms (CGH). The procedure for making the E-beam written CGH along with its properties will be described. Application of these CGH's to spatial frequency multiplexed optical processors for pattern recognition will be discussed.

Original languageEnglish (US)
Pages (from-to)48-53
Number of pages6
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume437
DOIs
StatePublished - Oct 26 1983

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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