A thin film comprising parallel tilted nanorods was deposited by directing silver vapor obliquely towards a plane substrate. The reflection and transmission coefficients of the thin film were measured at three wavelengths in the visible regime for normal-illumination conditions, using ellipsometry and walk-off interferometry. The thin film was found to display a negative real refractive index. Since vapor deposition is a well- established industrial technique to deposit thin films, this finding is promising for large-scale production of negatively refracting metamaterials.
All Science Journal Classification (ASJC) codes
- Atomic and Molecular Physics, and Optics