Vapor-deposited thin films with negative real refractive index in the visible regime

Yi Jun Jen, Akhlesh Lakhtakia, Ching Wei Yu, Chin Te Lin

Research output: Contribution to journalArticle

42 Scopus citations

Abstract

A thin film comprising parallel tilted nanorods was deposited by directing silver vapor obliquely towards a plane substrate. The reflection and transmission coefficients of the thin film were measured at three wavelengths in the visible regime for normal-illumination conditions, using ellipsometry and walk-off interferometry. The thin film was found to display a negative real refractive index. Since vapor deposition is a well- established industrial technique to deposit thin films, this finding is promising for large-scale production of negatively refracting metamaterials.

Original languageEnglish (US)
Pages (from-to)7784-7789
Number of pages6
JournalOptics Express
Volume17
Issue number10
DOIs
StatePublished - May 11 2009

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

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