Vapor-deposited thin films with negative real refractive index in the visible regime

Yi Jun Jen, Akhlesh Lakhtakia, Ching Wei Yu, Chin Te Lin

Research output: Contribution to journalArticle

42 Citations (Scopus)

Abstract

A thin film comprising parallel tilted nanorods was deposited by directing silver vapor obliquely towards a plane substrate. The reflection and transmission coefficients of the thin film were measured at three wavelengths in the visible regime for normal-illumination conditions, using ellipsometry and walk-off interferometry. The thin film was found to display a negative real refractive index. Since vapor deposition is a well- established industrial technique to deposit thin films, this finding is promising for large-scale production of negatively refracting metamaterials.

Original languageEnglish (US)
Pages (from-to)7784-7789
Number of pages6
JournalOptics Express
Volume17
Issue number10
DOIs
StatePublished - May 11 2009

Fingerprint

vapors
refractivity
thin films
nanorods
ellipsometry
interferometry
illumination
deposits
silver
vapor deposition
reflectance
coefficients
wavelengths

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

Cite this

Jen, Yi Jun ; Lakhtakia, Akhlesh ; Yu, Ching Wei ; Lin, Chin Te. / Vapor-deposited thin films with negative real refractive index in the visible regime. In: Optics Express. 2009 ; Vol. 17, No. 10. pp. 7784-7789.
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Vapor-deposited thin films with negative real refractive index in the visible regime. / Jen, Yi Jun; Lakhtakia, Akhlesh; Yu, Ching Wei; Lin, Chin Te.

In: Optics Express, Vol. 17, No. 10, 11.05.2009, p. 7784-7789.

Research output: Contribution to journalArticle

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