Wetting temperature shift of helium on a layered substrate

E. Cheng, Milton Walter Cole, W. F. Saam, J. Treiner

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

We calculate the shift in wetting temperature TW of a He film on a layered substrate. The latter consists of an alkali metal layer film of thickness d, deposited on a semi-infinite medium. TW can change from nonzero to zero (Cs) or vice versa (Na) as d changes. The shift is an extremely sensitive probe of long range van der Waals potentials.

Original languageEnglish (US)
Pages (from-to)739-742
Number of pages4
JournalJournal of Low Temperature Physics
Volume89
Issue number3-4
DOIs
StatePublished - Nov 1 1992

Fingerprint

Helium
wetting
Wetting
helium
Alkali Metals
shift
Alkali metals
Substrates
alkali metals
Temperature
temperature
probes

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Cheng, E. ; Cole, Milton Walter ; Saam, W. F. ; Treiner, J. / Wetting temperature shift of helium on a layered substrate. In: Journal of Low Temperature Physics. 1992 ; Vol. 89, No. 3-4. pp. 739-742.
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Cheng, E, Cole, MW, Saam, WF & Treiner, J 1992, 'Wetting temperature shift of helium on a layered substrate', Journal of Low Temperature Physics, vol. 89, no. 3-4, pp. 739-742. https://doi.org/10.1007/BF00694130

Wetting temperature shift of helium on a layered substrate. / Cheng, E.; Cole, Milton Walter; Saam, W. F.; Treiner, J.

In: Journal of Low Temperature Physics, Vol. 89, No. 3-4, 01.11.1992, p. 739-742.

Research output: Contribution to journalArticle

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