X-Ray Photoelectron and Auger Spectroscopic Study of the Underpotential Deposition of Ag and Cu on Pt Electrodes

J. S. Hammond, Nicholas Winograd

Research output: Contribution to journalArticle

36 Citations (Scopus)

Abstract

The underpotential deposition of monolayer quantities of Ag and Cu has been studied using XPS and Auger spectroscopy. XPS chemical shifts of −0.65 and −0.95 eV vs. the bulk metal have been observed although no distinction was noted between the various underpotential states present in the cyclic voltammogram. The shifts were identical to vapor-deposited submonolayer films of Ag and Cu on Pt in the low coverage (θ ~ 0.1) limit. A gradual shift with coverage to the bulk metal value for the vapor-deposited films and a constant shift with coverage for the underpotential deposit indicated that islanding was present only in the evaporated films. Measurement of the Cu and Ag Auger spectra gave results independent of the surface work function when compared to the XPS spectra. Interpretation of this Auger parameter is, however, at present ambiguous.

Original languageEnglish (US)
Pages (from-to)826-833
Number of pages8
JournalJournal of the Electrochemical Society
Volume124
Issue number6
DOIs
StatePublished - Jan 1 1977

Fingerprint

Photoelectrons
X ray photoelectron spectroscopy
X rays
Electrodes
Metals
Vapors
Chemical shift
Monolayers
Deposits
Spectroscopy

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

Cite this

@article{91746250cb024c4594e3a5ff81a0c1f2,
title = "X-Ray Photoelectron and Auger Spectroscopic Study of the Underpotential Deposition of Ag and Cu on Pt Electrodes",
abstract = "The underpotential deposition of monolayer quantities of Ag and Cu has been studied using XPS and Auger spectroscopy. XPS chemical shifts of −0.65 and −0.95 eV vs. the bulk metal have been observed although no distinction was noted between the various underpotential states present in the cyclic voltammogram. The shifts were identical to vapor-deposited submonolayer films of Ag and Cu on Pt in the low coverage (θ ~ 0.1) limit. A gradual shift with coverage to the bulk metal value for the vapor-deposited films and a constant shift with coverage for the underpotential deposit indicated that islanding was present only in the evaporated films. Measurement of the Cu and Ag Auger spectra gave results independent of the surface work function when compared to the XPS spectra. Interpretation of this Auger parameter is, however, at present ambiguous.",
author = "Hammond, {J. S.} and Nicholas Winograd",
year = "1977",
month = "1",
day = "1",
doi = "10.1149/1.2133420",
language = "English (US)",
volume = "124",
pages = "826--833",
journal = "Journal of the Electrochemical Society",
issn = "0013-4651",
publisher = "Electrochemical Society, Inc.",
number = "6",

}

X-Ray Photoelectron and Auger Spectroscopic Study of the Underpotential Deposition of Ag and Cu on Pt Electrodes. / Hammond, J. S.; Winograd, Nicholas.

In: Journal of the Electrochemical Society, Vol. 124, No. 6, 01.01.1977, p. 826-833.

Research output: Contribution to journalArticle

TY - JOUR

T1 - X-Ray Photoelectron and Auger Spectroscopic Study of the Underpotential Deposition of Ag and Cu on Pt Electrodes

AU - Hammond, J. S.

AU - Winograd, Nicholas

PY - 1977/1/1

Y1 - 1977/1/1

N2 - The underpotential deposition of monolayer quantities of Ag and Cu has been studied using XPS and Auger spectroscopy. XPS chemical shifts of −0.65 and −0.95 eV vs. the bulk metal have been observed although no distinction was noted between the various underpotential states present in the cyclic voltammogram. The shifts were identical to vapor-deposited submonolayer films of Ag and Cu on Pt in the low coverage (θ ~ 0.1) limit. A gradual shift with coverage to the bulk metal value for the vapor-deposited films and a constant shift with coverage for the underpotential deposit indicated that islanding was present only in the evaporated films. Measurement of the Cu and Ag Auger spectra gave results independent of the surface work function when compared to the XPS spectra. Interpretation of this Auger parameter is, however, at present ambiguous.

AB - The underpotential deposition of monolayer quantities of Ag and Cu has been studied using XPS and Auger spectroscopy. XPS chemical shifts of −0.65 and −0.95 eV vs. the bulk metal have been observed although no distinction was noted between the various underpotential states present in the cyclic voltammogram. The shifts were identical to vapor-deposited submonolayer films of Ag and Cu on Pt in the low coverage (θ ~ 0.1) limit. A gradual shift with coverage to the bulk metal value for the vapor-deposited films and a constant shift with coverage for the underpotential deposit indicated that islanding was present only in the evaporated films. Measurement of the Cu and Ag Auger spectra gave results independent of the surface work function when compared to the XPS spectra. Interpretation of this Auger parameter is, however, at present ambiguous.

UR - http://www.scopus.com/inward/record.url?scp=0017505821&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0017505821&partnerID=8YFLogxK

U2 - 10.1149/1.2133420

DO - 10.1149/1.2133420

M3 - Article

VL - 124

SP - 826

EP - 833

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

SN - 0013-4651

IS - 6

ER -