X-RAY PHOTOELECTRON SPECTROSCOPY AND SECONDARY ION MASS SPECTROMETRY: A MULTITECHNIQUE APPROACH TO SURFACE ANALYSIS.

A. Shepard, R. W. Hewitt, W. E. Baitinger, G. J. Slusser, Nicholas Winograd, G. L. Ott, W. N. Delgass

Research output: Contribution to journalConference article

3 Citations (Scopus)

Abstract

The combination of X-ray photoelectron spectroscopy (XPS) with seconary ion mass spectroscopy (SIMS) promises to provide a powerful new approach both to quantitative analysis of surface composition and to the elucidation of surface molecular structure. In this work, the ultrahigh vacuum XPX/SIMS system was tested to characterize a variety of metal, alloy, and metal oxygen surfaces. The examination of clean silver surfaces where ions of clusters up to Ag//n** plus where n equals 1 to 5 have been observed. Studies have also been carried out on iron/ruthenium catalyst surfaces and on clean indium foils exposed to controlled doses of oxygen.

Original languageEnglish (US)
Pages (from-to)187-203
Number of pages17
JournalASTM Special Technical Publication
Issue number643
StatePublished - Jan 1 1978
EventQuant Surf Anal of Mater, Symp held in conjunction with Pittsburgh Conf on Anal Chem and Appl Spectrosc - Cleveland, OH, USA
Duration: Mar 2 1977Mar 3 1977

Fingerprint

Surface analysis
Secondary ion mass spectrometry
X ray photoelectron spectroscopy
Ions
Spectroscopy
Oxygen
Ultrahigh vacuum
Metals
Ruthenium
Surface structure
Indium
Metal foil
Molecular structure
Silver
Iron
Catalysts
Chemical analysis

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Shepard, A., Hewitt, R. W., Baitinger, W. E., Slusser, G. J., Winograd, N., Ott, G. L., & Delgass, W. N. (1978). X-RAY PHOTOELECTRON SPECTROSCOPY AND SECONDARY ION MASS SPECTROMETRY: A MULTITECHNIQUE APPROACH TO SURFACE ANALYSIS. ASTM Special Technical Publication, (643), 187-203.
Shepard, A. ; Hewitt, R. W. ; Baitinger, W. E. ; Slusser, G. J. ; Winograd, Nicholas ; Ott, G. L. ; Delgass, W. N. / X-RAY PHOTOELECTRON SPECTROSCOPY AND SECONDARY ION MASS SPECTROMETRY : A MULTITECHNIQUE APPROACH TO SURFACE ANALYSIS. In: ASTM Special Technical Publication. 1978 ; No. 643. pp. 187-203.
@article{25bbe0baf29d4a92b6a3939eef8148b7,
title = "X-RAY PHOTOELECTRON SPECTROSCOPY AND SECONDARY ION MASS SPECTROMETRY: A MULTITECHNIQUE APPROACH TO SURFACE ANALYSIS.",
abstract = "The combination of X-ray photoelectron spectroscopy (XPS) with seconary ion mass spectroscopy (SIMS) promises to provide a powerful new approach both to quantitative analysis of surface composition and to the elucidation of surface molecular structure. In this work, the ultrahigh vacuum XPX/SIMS system was tested to characterize a variety of metal, alloy, and metal oxygen surfaces. The examination of clean silver surfaces where ions of clusters up to Ag//n** plus where n equals 1 to 5 have been observed. Studies have also been carried out on iron/ruthenium catalyst surfaces and on clean indium foils exposed to controlled doses of oxygen.",
author = "A. Shepard and Hewitt, {R. W.} and Baitinger, {W. E.} and Slusser, {G. J.} and Nicholas Winograd and Ott, {G. L.} and Delgass, {W. N.}",
year = "1978",
month = "1",
day = "1",
language = "English (US)",
pages = "187--203",
journal = "ASTM Special Technical Publication",
issn = "0066-0558",
number = "643",

}

X-RAY PHOTOELECTRON SPECTROSCOPY AND SECONDARY ION MASS SPECTROMETRY : A MULTITECHNIQUE APPROACH TO SURFACE ANALYSIS. / Shepard, A.; Hewitt, R. W.; Baitinger, W. E.; Slusser, G. J.; Winograd, Nicholas; Ott, G. L.; Delgass, W. N.

In: ASTM Special Technical Publication, No. 643, 01.01.1978, p. 187-203.

Research output: Contribution to journalConference article

TY - JOUR

T1 - X-RAY PHOTOELECTRON SPECTROSCOPY AND SECONDARY ION MASS SPECTROMETRY

T2 - A MULTITECHNIQUE APPROACH TO SURFACE ANALYSIS.

AU - Shepard, A.

AU - Hewitt, R. W.

AU - Baitinger, W. E.

AU - Slusser, G. J.

AU - Winograd, Nicholas

AU - Ott, G. L.

AU - Delgass, W. N.

PY - 1978/1/1

Y1 - 1978/1/1

N2 - The combination of X-ray photoelectron spectroscopy (XPS) with seconary ion mass spectroscopy (SIMS) promises to provide a powerful new approach both to quantitative analysis of surface composition and to the elucidation of surface molecular structure. In this work, the ultrahigh vacuum XPX/SIMS system was tested to characterize a variety of metal, alloy, and metal oxygen surfaces. The examination of clean silver surfaces where ions of clusters up to Ag//n** plus where n equals 1 to 5 have been observed. Studies have also been carried out on iron/ruthenium catalyst surfaces and on clean indium foils exposed to controlled doses of oxygen.

AB - The combination of X-ray photoelectron spectroscopy (XPS) with seconary ion mass spectroscopy (SIMS) promises to provide a powerful new approach both to quantitative analysis of surface composition and to the elucidation of surface molecular structure. In this work, the ultrahigh vacuum XPX/SIMS system was tested to characterize a variety of metal, alloy, and metal oxygen surfaces. The examination of clean silver surfaces where ions of clusters up to Ag//n** plus where n equals 1 to 5 have been observed. Studies have also been carried out on iron/ruthenium catalyst surfaces and on clean indium foils exposed to controlled doses of oxygen.

UR - http://www.scopus.com/inward/record.url?scp=0017914758&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0017914758&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0017914758

SP - 187

EP - 203

JO - ASTM Special Technical Publication

JF - ASTM Special Technical Publication

SN - 0066-0558

IS - 643

ER -