X-RAY PHOTOELECTRON SPECTROSCOPY AND SECONDARY ION MASS SPECTROMETRY: A MULTITECHNIQUE APPROACH TO SURFACE ANALYSIS.

A. Shepard, R. W. Hewitt, W. E. Baitinger, G. J. Slusser, Nicholas Winograd, G. L. Ott, W. N. Delgass

Research output: Contribution to journalConference article

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Abstract

The combination of X-ray photoelectron spectroscopy (XPS) with seconary ion mass spectroscopy (SIMS) promises to provide a powerful new approach both to quantitative analysis of surface composition and to the elucidation of surface molecular structure. In this work, the ultrahigh vacuum XPX/SIMS system was tested to characterize a variety of metal, alloy, and metal oxygen surfaces. The examination of clean silver surfaces where ions of clusters up to Ag//n** plus where n equals 1 to 5 have been observed. Studies have also been carried out on iron/ruthenium catalyst surfaces and on clean indium foils exposed to controlled doses of oxygen.

Original languageEnglish (US)
Pages (from-to)187-203
Number of pages17
JournalASTM Special Technical Publication
Issue number643
StatePublished - Jan 1 1978
EventQuant Surf Anal of Mater, Symp held in conjunction with Pittsburgh Conf on Anal Chem and Appl Spectrosc - Cleveland, OH, USA
Duration: Mar 2 1977Mar 3 1977

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All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Shepard, A., Hewitt, R. W., Baitinger, W. E., Slusser, G. J., Winograd, N., Ott, G. L., & Delgass, W. N. (1978). X-RAY PHOTOELECTRON SPECTROSCOPY AND SECONDARY ION MASS SPECTROMETRY: A MULTITECHNIQUE APPROACH TO SURFACE ANALYSIS. ASTM Special Technical Publication, (643), 187-203.